Shanghai, China

YongMeng Lee

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: YongMeng Lee: Innovator in Semiconductor Technology

Introduction

YongMeng Lee is a prominent inventor based in Shanghai, China, known for his contributions to semiconductor technology. With a focus on improving manufacturing methods, he has developed innovative solutions that enhance device performance and efficiency. His work has led to the filing of multiple patents, showcasing his expertise in the field.

Latest Patents

YongMeng Lee holds 2 patents that reflect his innovative approach to semiconductor device manufacturing. One of his latest patents is a "Semiconductor device manufacturing method with reduced gate electrode height loss and related devices." This patent presents a manufacturing method that includes providing a semiconductor structure with a substrate and source region, along with an interlayer dielectric layer. The method aims to reduce the loss of the interlayer dielectric layer, thereby minimizing the height loss of the gate electrode.

Another significant patent is the "Method for manufacturing a semiconductor device having a fin located on a substrate." This disclosure relates to semiconductor processes and describes a device that includes a substrate with two fins extending along a specific direction. The method emphasizes the importance of isolation material layers and their alignment with the fins, contributing to the overall efficiency of semiconductor devices.

Career Highlights

YongMeng Lee has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation and SMIC Advanced Technology Research & Development Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technology in semiconductor manufacturing.

Collaborations

Throughout his career, YongMeng Lee has collaborated with talented professionals, including Yang Liu and Shaofeng Yu. These collaborations have fostered an environment of innovation and have led to significant advancements in semiconductor technology.

Conclusion

YongMeng Lee's contributions to semiconductor technology through his patents and career achievements highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor manufacturing, making a lasting impact on the industry.

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