Shanghai, China

Yongji Mao


Average Co-Inventor Count = 2.1

ph-index = 1


Company Filing History:


Years Active: 2021-2022

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3 patents (USPTO):Explore Patents

Title: Yongji Mao: Innovator in Semiconductor Manufacturing

Introduction

Yongji Mao is a prominent inventor based in Shanghai, China, known for his contributions to semiconductor manufacturing. With a total of 3 patents, he has made significant advancements in the field, particularly in the development of methods for improving semiconductor structures.

Latest Patents

One of Yongji Mao's latest patents is a method for manufacturing a 14nm-node BEOL 32nm-width metal. This innovative method provides a semiconductor structure that includes a carbon coating and an intermediate layer. The process involves forming a photoresist layer, exposing it according to a layout, and developing it to create a peg groove. This technique reduces the longitudinal shrink of the metal wire, enhances uniformity, and minimizes defects, ultimately increasing the effective usable area of a chip.

Another notable patent is related to FinFET technology and its manufacturing method. This method includes generating an interlayer dielectric layer, a metal hard mask, and a tri-layer mask on a gate. The process allows for precise control of the critical dimensions of the contact in both X and Y directions, showcasing Yongji's expertise in semiconductor fabrication.

Career Highlights

Yongji Mao has worked with notable companies such as Shanghai Huali Integrated Circuit Corporation and Shanghai Huali Integrated Circuit Mfg. Co., Ltd. His experience in these organizations has contributed to his innovative work in semiconductor technology.

Collaborations

Yongji has collaborated with several professionals in the field, including Ronghong Ye and Liyao Liu. These collaborations have likely fostered an environment of innovation and shared knowledge, further enhancing his contributions to semiconductor manufacturing.

Conclusion

Yongji Mao's work in semiconductor manufacturing has led to significant advancements in the industry. His innovative patents and collaborations reflect his commitment to improving technology and enhancing the efficiency of semiconductor devices.

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