Yong-Sin Chang

Title: Yong-Sin Chang: Innovator in Semiconductor Technology

Introduction: Yong-Sin Chang is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of image sensors. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this highly technical domain.

Latest Patents: Yong-Sin Chang holds a patent for an "Image sensor having an RPO layer containing nitrogen." This patent describes a semiconductor structure that includes a transistor formed over a substrate. The transistor features a transistor gate and at least one source/drain region. Additionally, the semiconductor structure includes a pre-determined region coupled to the transistor. A resist protection oxide (RPO) layer is formed over the pre-determined region, with the RPO layer having a nitrogen level of about 0.35 atomic % or less. This innovation is crucial for enhancing the performance and efficiency of image sensors.

Career Highlights: Yong-Sin Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role at the company allows him to work on cutting-edge technologies and contribute to advancements in semiconductor manufacturing processes.

Collaborations: Throughout his career, Yong-Sin has collaborated with talented individuals in the field. Notable coworkers include Yao Hsiang Liang and Wen-Kung Cheng, who have also made significant contributions to semiconductor technology.

Conclusion: Yong-Sin Chang's work in semiconductor technology, particularly his patent for an image sensor, highlights his innovative spirit and technical expertise. His contributions continue to influence the industry and pave the way for future advancements in technology.