For the Inventor, By the Inventor

Enter inventor name

Yokohama, Japan

Yoneta Tanaka

USPTO Granted Patents = 12

Average Co-Inventor Count = 1.2

ph-index = 6

Forward Citations = 116(Granted Patents)

Location History:

Kanagawa, JP (1996)
Kanagawa-ken, JP (1999)
Yokohama, JP (1998 - 2006)
Tokyo, JP (2023)

Company Filing History:

Ushio Denki Kabushiki Kaisha

Years Active: 1996-2023

Loading Chart...

12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11701868 - Carbon fiber reinforced plastic structure and processing apparatus (2023-07-18),

2. 6998738 - Plain surface stage apparatus (2006-02-14),

3. 6525804 - Exposure device capable of aligning while moving mask (2003-02-25),

4. 6232023 - Contact exposure process and device (2001-05-15),

5. 6072915 - Process for pattern searching and a device for positioning of a mask to (2000-06-06),

6. 6046793 - Proximity printing device with variable irradiation angle (2000-04-04),

7. 5940528 - Process for positioning of a mask relative to another mask, or masks (1999-08-17),

8. 5934780 - Polarized light irradiation device for purposes of optical alignment of (1999-08-10),

9. 5881165 - Process for the positioning of a mask relative to a workpiece and device (1999-03-09),

10. 5874190 - Process for projection exposure of a workpiece with back alignment marks (1999-02-23),

11. 5777747 - Process for positioning a mask relative to a workpiece and device for (1998-07-07),

12. 5543890 - Process and device for adjusting the distance between a workpiece and a (1996-08-06),

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Loading…