logo

For the Inventor, By the Inventor

Yokohama, Japan

Yoneta Tanaka

This inventor holds 12 USPTO granted patents. Top assignee: Ushio Denki Kabushiki Kaisha. Active years: 1996-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoneta Tanaka. Retrieved from https://idiyas.com/inventor/yoneta-tanaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12

% Patents Active = 83.3

Average Co-Inventor Count = 1.2

ph-index = 6

Forward Citations = 117(Granted Patents)


Location History:

  • Kanagawa, JP (1996)
  • Kanagawa-ken, JP (1999)
  • Yokohama, JP (1998 - 2006)
  • Tokyo, JP (2023)

Company Filing History:

goldMedal12 out of 840 
 
Ushio Denki Kabushiki Kaisha
 patents

Years Active: 1996-2023

Loading Chart...
12 patents (USPTO):Explore Patents
1. 11701868 - Carbon fiber reinforced plastic structure and processing apparatus (2023-07-18),
2. 6998738 - Plain surface stage apparatus (2006-02-14),
3. 6525804 - Exposure device capable of aligning while moving mask (2003-02-25),
4. 6232023 - Contact exposure process and device (2001-05-15),
5. 6072915 - Process for pattern searching and a device for positioning of a mask to (2000-06-06),
6. 6046793 - Proximity printing device with variable irradiation angle (2000-04-04),
7. 5940528 - Process for positioning of a mask relative to another mask, or masks (1999-08-17),
8. 5934780 - Polarized light irradiation device for purposes of optical alignment of (1999-08-10),
9. 5881165 - Process for the positioning of a mask relative to a workpiece and device (1999-03-09),
10. 5874190 - Process for projection exposure of a workpiece with back alignment marks (1999-02-23),
11. 5777747 - Process for positioning a mask relative to a workpiece and device for (1998-07-07),
12. 5543890 - Process and device for adjusting the distance between a workpiece and a (1996-08-06),

Title: The Innovations of Yoneta Tanaka

Introduction

Yoneta Tanaka is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced carbon fiber reinforced plastic structures. With a total of 12 patents to his name, Tanaka continues to push the boundaries of innovation.

Latest Patents

Among his latest patents is a groundbreaking carbon fiber reinforced plastic structure and processing apparatus. This invention features a CFRP structure that boasts low surface roughness and reduced deformation due to residual stress and temperature changes. The structure includes a carbon fiber reinforced plastic member with a resin layer that has a smoother opposite surface compared to the first surface. Another notable patent is the plain surface stage apparatus, which consists of a platen with a plain surface and a combination of stationary and displacement type supports. This apparatus allows for precise adjustments and holds a selected displaced state, enhancing its functionality.

Career Highlights

Tanaka's career is marked by his dedication to innovation and excellence in engineering. He has worked extensively on projects that enhance the performance and reliability of materials used in various applications. His expertise in carbon fiber technology has positioned him as a leader in his field.

Collaborations

Throughout his career, Tanaka has collaborated with talented individuals such as Shoichi Okada and Hiromi Kai. These partnerships have fostered a creative environment that has led to the development of innovative solutions in materials science.

Conclusion

Yoneta Tanaka's contributions to the field of materials science through his patents and collaborations highlight his role as a key innovator. His work continues to influence the industry and inspire future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…