The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2001
Filed:
Apr. 27, 1999
Toshiyuki Matsuki, Yokohama, JP;
Yoneta Tanaka, Yokohama, JP;
Ushiodenki Kabushiki Kaisah, Tokyo, JP;
Abstract
A contact exposure device and process in which there is no danger of damage to the mask, and in which the workpiece is not damaged is achieved by a back up ring or the like being provided between a mask carrier and a workpiece carrier. The workpiece carrier and the mask carrier are moved apart from one another by a stipulated distance. The mask and the workpiece are attached by vacuum suction or the like on the mask carrier and the workpiece carrier, respectively. A subatmospheric pressure is produced in the space between the mask and the workpiece. Since the workpiece carrier and the mask carrier are moved apart from one another by a stipulated distance, the mask does bend when the pressure is reduced, but the mask and the workpiece do not come into contact. In this state, air is supplied from a compressor to openings in the workpiece carrier, causing the workpiece to be raised and arranged tightly against the mask, at which point, exposure is performed.