The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2003
Filed:
Feb. 08, 2001
Yoneta Tanaka, Yokohama, JP;
Ushiodenki Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure device and method that transfers a pattern on a mask onto a workpiece including a movable mask stage that holds the mask with the pattern, an alignment microscope movably mounted relative to the workpiece and is adapted to detect a mask alignment mark formed on the mask and a workpiece alignment mark formed on the workpiece, and a control unit adapted to move the mask stage to align the mask alignment mark and the workpiece alignment mark to thereby align the mask and the workpiece. In one embodiment, the alignment microscope is integrated with the mask stage and moves with the mask stage. In another embodiment, the alignment microscope includes an alignment microscope drive device that allows independent movement of the alignment microscope relative to the mask stage. In both embodiments, the control unit may be adapted to move the alignment microscope in search for the workpiece alignment mark if the workpiece alignment mark is initially not detected to be within a field of the alignment microscope.