Yonah Cho

Title: Innovations of Yonah Cho

Introduction

Yonah Cho is a prominent inventor based in Sunnyvale, California. He has made significant contributions to the field of semiconductor technology, holding a total of eight patents. His work focuses on methods for processing substrates and enhancing the performance of NMOS transistors.

Latest Patents

One of his latest patents is titled "Methods of forming oxide layers on substrates." This patent describes a method for processing a substrate that includes an oxide layer with defects. The method involves exposing the oxide layer to a plasma formed from an oxygen-containing gas to repair these defects. Additionally, the patent outlines various embodiments for forming the oxide layer, including depositing it atop the substrate and thermally oxidizing the surface at temperatures around 700 degrees Celsius or below.

Another notable patent is "NMOS transistor devices and methods for fabricating same." This invention provides NMOS transistors with controlled channel strain and junction resistance. The patent details the structure of the NMOS transistor, which includes a transistor stack with a gate dielectric and a gate electrode formed atop a p-type silicon region. The source/drain region is designed to enhance performance by incorporating lattice adjusting elements and n-type dopants.

Career Highlights

Yonah Cho is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His innovative work has contributed to advancements in semiconductor fabrication techniques, making him a valuable asset to his organization.

Collaborations

Throughout his career, Yonah has collaborated with notable colleagues, including Yihwan Kim and Christopher Sean Olsen. These collaborations have further enriched his research and development efforts in the field.

Conclusion

Yonah Cho's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor. His innovative methods for processing substrates and enhancing NMOS transistors continue to impact the industry significantly.