The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2012

Filed:

Jul. 26, 2011
Applicants:

Sunderraj Thirupapuliyur, San Jose, CA (US);

Faran Nouri, Los Altos, CA (US);

Yonah Cho, Sunnyvale, CA (US);

Inventors:

Sunderraj Thirupapuliyur, San Jose, CA (US);

Faran Nouri, Los Altos, CA (US);

Yonah Cho, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/94 (2006.01); H01L 31/062 (2006.01); H01L 31/113 (2006.01); H01L 31/119 (2006.01);
U.S. Cl.
CPC ...
Abstract

NMOS transistors having controlled channel strain and junction resistance and methods for the fabrication of same are provided herein. In some embodiments, an NMOS transistor may include a transistor stack comprising a gate dielectric and a gate electrode formed atop a p-type silicon region; and a source/drain region disposed on both sides of the transistor stack and defining a channel region therebetween and beneath the transistor stack, the source drain region including a first silicon layer having a lattice adjusting element and one or more second silicon layers having a lattice adjusting element and an n-type dopant disposed atop the first silicon layer.


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