Location History:
- Tokyo, JP (1993)
- Nakakoma, JP (1995)
- Yamanashi-ken, JP (1996 - 1998)
Company Filing History:
4 out of 10,326 
2 out of 71 
1 out of 51 
Years Active: 1993-1998
Title: The Innovations of Yoichi Kurono
Introduction
Yoichi Kurono is a notable inventor based in Yamanashi-ken, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of four patents. His work focuses on enhancing the efficiency and precision of plasma processing apparatuses.
Latest Patents
Kurono's latest patents include a plasma processing apparatus designed for subjecting semiconductor wafers to anisotropic etching. This innovative apparatus features a process chamber that can be set to a vacuum, with upper and lower electrodes positioned opposite each other. An etching gas is converted into plasma between these electrodes. The apparatus also includes an electrostatic chuck on which the wafer is mounted. A movable ring made of dielectric material is arranged between the electrodes, with a central hood that corresponds to the wafer's marginal portion. During the etching process, this hood covers the marginal portion of the wafer under a plasma sheath, preventing it from being etched and ensuring precision in the etching process.
Career Highlights
Throughout his career, Yoichi Kurono has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and Tokyo Electron Yamanashi Limited. His experience in these organizations has allowed him to develop and refine his innovative technologies.
Collaborations
Kurono has collaborated with esteemed colleagues such as Shigeki Tozawa and Shozo Hosoda. Their combined expertise has contributed to the advancement of semiconductor processing technologies.
Conclusion
Yoichi Kurono's contributions to the field of semiconductor processing through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and pave the way for future advancements.