Yiyang Wan

Title: Yiyang Wan: Innovator in Titanium Material Technology

Introduction

Yiyang Wan is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of materials science. His innovative work focuses on enhancing the properties of titanium materials, which are widely used in various industries.

Latest Patents

Yiyang Wan holds a patent for a method and apparatus for nitride capping of titanium materials to improve barrier properties. This patent, titled "Nitride capping of titanium material to improve barrier properties," describes a process that involves forming a titanium nitride layer upon a titanium material layer using chemical vapor deposition techniques. The method includes exposing the titanium material layer to a hydrogen-rich nitrogen-containing plasma, followed by a nitrogen-rich plasma. The titanium nitride layer is then treated with an argon plasma and subjected to a halide soak process. This innovative approach enhances the barrier properties of titanium materials, making them more effective for various applications. He has 1 patent to his name.

Career Highlights

Yiyang Wan is currently employed at Applied Materials, Inc., a leading company in the semiconductor and materials engineering industry. His work at Applied Materials has allowed him to collaborate with other experts in the field and contribute to advancements in material technologies.

Collaborations

One of his notable coworkers is Takashi Kuratomi, with whom he has likely shared insights and expertise in their respective areas of research.

Conclusion

Yiyang Wan's contributions to the field of titanium materials through his innovative patent demonstrate his commitment to advancing technology in materials science. His work at Applied Materials, Inc. continues to influence the industry positively.