Yingwei Dai

Title: Innovations of Yingwei Dai in Substrate Cleaning Technologies

Introduction

Yingwei Dai is a notable inventor based in Shanghai, China. He has made significant contributions to the field of substrate cleaning technologies. With a total of 3 patents to his name, his work focuses on improving cleaning methods through innovative techniques.

Latest Patents

Yingwei Dai's latest patents include a method and apparatus for cleaning substrates using high-temperature chemicals and ultrasonic devices. The first patent describes a method that involves rotating a substrate while delivering deionized water for pre-wetting. It also includes the application of a high-temperature chemical solution for cleaning, followed by the use of an ultrasonic device to enhance the cleaning process. The second patent outlines a high-temperature chemical solution supply system, which consists of a solution tank, a buffer tank, and pumps to facilitate the cleaning process. This system is designed to effectively remove contaminants from substrates, ensuring high-quality results.

Career Highlights

Yingwei Dai is currently employed at Acm Research (Shanghai) Inc., where he continues to develop innovative cleaning solutions. His expertise in the field has led to advancements that benefit various industries reliant on substrate cleanliness.

Collaborations

Yingwei has collaborated with notable coworkers, including Fuping Chen and Hui Wang, who contribute to the innovative environment at Acm Research.

Conclusion

Yingwei Dai's contributions to substrate cleaning technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the field and provide effective solutions for improved cleaning processes.