This inventor holds 2 USPTO granted patents. Top assignees: Hefechip Corporation Limited, Semiconductor Manufacturing International (Beijing) Corporation, Semiconductor Manufacturing International (Shanghai) Corporation. Active years: 2022-2025.
Company Filing History:
1 out of 29 
1 out of 948 
1 out of 1,749 
Years Active: 2022-2025
Title: Innovations of Yingfang Wang in Optical Modeling and Mask Pattern Correction
Introduction
Yingfang Wang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor manufacturing, particularly in optical modeling and mask pattern correction. With a total of 2 patents, his work has advanced the techniques used in photolithography and pattern design.
Latest Patents
Yingfang Wang's latest patents include an innovative OPC modeling method. This method involves determining optical model parameters and resist model parameters, obtaining various parameter combinations through stochastic selection, and performing photolithography simulations. The process evaluates these combinations according to the Pareto principle, applying genetic algorithms to optimize the parameters for OPC modeling.
Another significant patent is a method for correcting mask patterns. This method entails providing a target layout with multiple main patterns, dividing the layout into regions, and acquiring position information for each region. It also involves arranging auxiliary patterns around the main patterns based on specific parameters, enhancing the accuracy of mask designs.
Career Highlights
Yingfang Wang has worked with prominent companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in semiconductor manufacturing.
Collaborations
Throughout his career, Yingfang has collaborated with talented individuals such as Feng Bai and Wanjuan Zhang. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Yingfang Wang's contributions to optical modeling and mask pattern correction demonstrate his expertise and commitment to advancing semiconductor technology. His innovative patents reflect a deep understanding of the complexities involved in photolithography and pattern design.