This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2024-2026.
Company Filing History:
Years Active: 2024-2026
Title: Innovations of Ying-Chuen Wang in Semiconductor Technology
Introduction
Ying-Chuen Wang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on developing advanced methods for forming semiconductor devices, particularly through innovative wet etching chemistries.
Latest Patents
Wang's latest patents include a method of forming a semiconductor device using wet etching chemistry. This invention provides a wet etching chemistry designed to selectively remove polymer residue on an opening embedded in a low-k dielectric layer and an underlying stop layer during the formation of an interconnect structure. The wet etching chemistry comprises two types of organic solvents, with a concentration of at least 70%. Additionally, it includes an alkali source amine, which contains at least a tertiary amine, an inhibitor, and water. Notably, this wet etching chemistry is free of peroxide to prevent damage to the WdC hard mask.
Career Highlights
Ying-Chuen Wang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to innovate in semiconductor manufacturing processes. His expertise in wet etching chemistries has positioned him as a valuable asset in the industry.
Collaborations
Wang collaborates with esteemed colleagues, including Chieh-Yi Shen and Li-min Chen, who contribute to his research and development efforts in semiconductor technology.
Conclusion
Ying-Chuen Wang's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in semiconductor manufacturing processes.