Yida Li

Title: Yida Li: Innovator in Semiconductor Technology

Introduction

Yida Li is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to device structures and manufacturing methods.

Latest Patents

Yida Li's latest patents include a formation method of interconnection structure of semiconductor devices. This patent describes a method that involves forming a dielectric layer over a semiconductor substrate and creating an opening in the dielectric layer to expose a conductive element. The process also includes forming a conductive layer over the conductive element and modifying an upper portion of the conductive layer using a plasma operation to create a modified region. Additionally, the method outlines the formation of a conductive plug over the modified region. Another notable patent is focused on metal liner overhang reduction and its manufacturing method. This patent discloses methods for reducing overhangs by forming a recess in a dielectric layer and depositing a first conductive layer, which is then treated to remove the overhang before filling the recess with a second conductive layer.

Career Highlights

Yida Li is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing the technology used in semiconductor devices, contributing to the efficiency and performance of modern electronics.

Collaborations

Yida Li has collaborated with notable colleagues such as Pei-Wen Wu and Sung-Li Wang. Their combined expertise has fostered innovation and development within their projects.

Conclusion

Yida Li's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the advancement of semiconductor devices, showcasing the importance of innovation in technology.