Company Filing History:
Years Active: 2016-2022
Title: Yibin Huang - Innovator in Lithography Technology
Introduction
Yibin Huang, an accomplished inventor based in Shanghai, China, has made significant contributions to the field of lithography technology. With a total of three patents to his name, he has been instrumental in developing methods and systems that enhance lithographic quality, demonstrating a strong focus on innovation in semiconductor manufacturing.
Latest Patents
Huang's latest patents include a groundbreaking method for assistant pattern configuration and a revolutionary mask pattern alignment system. The assistant pattern configuration method involves providing a main pattern with edges extending in specific directions, thereby optimizing focal planes for improved lithographic operations. This method extracts configuration parameters corresponding to focal plane offsets, leading to enhanced pattern quality. His mask pattern alignment method significantly improves the alignment accuracy by dividing a wafer into multiple regions, optimizing compensation equations tailored to each region.
Career Highlights
Throughout his career, Yibin Huang has worked with prestigious firms, including Semiconductor Manufacturing International Corporation in Shanghai and Semiconductor Manufacturing International Corporation in Beijing. At these companies, he has honed his skills in semiconductor technology and lithography practices, establishing himself as a key player in this vital industry.
Collaborations
In addition to his impressive body of work, Huang has collaborated with talented individuals such as Wanjuan Zhang and Winnie Liu. These collaborations have allowed him to exchange ideas and enhance his inventions, further contributing to advancements in lithography and semiconductor applications.
Conclusion
Yibin Huang stands out as a leading inventor in lithography technology, with his innovative patents and collaborations driving progress in the semiconductor field. As his work continues to evolve, it is clear that Huang's contributions will play a significant role in shaping the future of lithographic processes.
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