Taipei, Taiwan

Yi-Yu Hsu


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 52(Granted Patents)


Company Filing History:


Years Active: 2002-2005

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3 patents (USPTO):Explore Patents

Title: Yi-Yu Hsu: Innovator in Photolithography Technology

Introduction

Yi-Yu Hsu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of photolithography, particularly in the development of advanced mask technologies. With a total of 3 patents to his name, Hsu's work has had a notable impact on the semiconductor industry.

Latest Patents

Hsu's latest patents include innovative technologies that enhance the efficiency and precision of photolithography processes. One of his key inventions is the "Alternating Phase Shift Mask," which features a transparent substrate and a light-shielding layer that defines a transparent array. This array consists of a plurality of first phase rows and second phase rows that are alternately interposed. Additionally, the mask includes a phase interference enhancement feature designed to improve the overall performance of the photolithography process.

Another significant patent is the "Process for Improving Critical Dimension Uniformity." This invention employs a double exposure and double etching method to enhance critical dimension uniformity across a wafer. By creating a coating layer on a wafer that includes distinct areas patterned under different processing conditions, Hsu's method successfully improves CD uniformity between the wafer center and edge, thereby increasing fabrication yield.

Career Highlights

Throughout his career, Yi-Yu Hsu has worked with leading companies in the semiconductor industry, including Winbond Electronics Corporation and United Microelectronics Corporation. His experience in these organizations has allowed him to refine his expertise in photolithography and contribute to groundbreaking advancements in the field.

Collaborations

Hsu has collaborated with notable professionals in his field, including Kuo-Chen Wang and Yao-Ting Shao. These collaborations have further enriched his work and have led to the development of innovative solutions in photolithography technology.

Conclusion

Yi-Yu Hsu is a distinguished inventor whose contributions to photolithography have significantly advanced the semiconductor industry. His innovative patents and collaborations reflect his commitment to enhancing technology and improving manufacturing processes.

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