The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2005
Filed:
Dec. 16, 2002
Chii-ming Shiah, Jubei, TW;
Yi-yu Hsu, Taipei, TW;
Yu-cheng Tung, Kaohsiung, TW;
Hung-yueh Liao, Ilan, TW;
Kao-tsai Tsai, Kaohsiung, TW;
Jong-bor Wang, Taipei, TW;
Chii-Ming Shiah, Jubei, TW;
Yi-Yu Hsu, Taipei, TW;
Yu-Cheng Tung, Kaohsiung, TW;
Hung-Yueh Liao, Ilan, TW;
Kao-Tsai Tsai, Kaohsiung, TW;
Jong-Bor Wang, Taipei, TW;
Winbond Electronics Corp., Hsinchu, TW;
Abstract
An alternating phase shift mask. The alternating phase shift mask includes a transparent substrate, a light-shielding layer disposed on the transparent substrate to define a transparent array consisting of a plurality of first phase rows and a plurality of second phase rows alternately interposed between the first phase rows. The alternating phase shift mask further comprises a phase interference enhancement feature disposed a predetermined distance from the outermost row of the transparent array, wherein the phases of the phase interference enhancement feature and the outermost row are reverse.