Yi Ying Zhang

Title: Yi Ying Zhang: Innovator in Semiconductor Technology

Introduction

Yi Ying Zhang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to device fabrication.

Latest Patents

Yi Ying Zhang's latest patents include a "Semiconductor device and fabrication method thereof." This patent describes a method for fabricating a semiconductor device, which involves several intricate steps such as forming an etch layer on a substrate, creating transitional and barrier layers, and patterning to form islands and trenches. Another notable patent is for a "Semiconductor device having composite structures and fabrication method thereof." This invention outlines a method for creating composite structures on a substrate, detailing the formation of mask layers and etching processes to achieve the desired semiconductor characteristics.

Career Highlights

Throughout his career, Yi Ying Zhang has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Yi Ying Zhang has collaborated with notable professionals in his field, including Zhi Jun Wang and Rong Yao Chang. These collaborations have further enhanced his work and contributed to the development of innovative semiconductor solutions.

Conclusion

Yi Ying Zhang's contributions to semiconductor technology through his patents and career achievements highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor fabrication methods.