Hsinchu, Taiwan

Yi-Tsang Hsieh

USPTO Granted Patents = 7 

Average Co-Inventor Count = 5.1

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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7 patents (USPTO):

Title: Spotlight on Inventor Yi-Tsang Hsieh: Innovating Semiconductor Manufacturing

Introduction: Yi-Tsang Hsieh, an accomplished inventor based in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of five patents to his name, Hsieh specializes in advanced plasma processing methods that enhance the manufacturing of semiconductor structures.

Latest Patents: One of Hsieh's latest innovations is a plasma processing method for manufacturing semiconductor structures. This method involves placing a wafer in a processing chamber surrounded by a focus ring, creating a plasma that processes the wafer. Hsieh's technology includes monitoring the thickness of the focus ring to adjust the plasma direction over the wafer's peripheral region. Another noteworthy patent focuses on small gas flow monitoring of dry etchers via Optical Emission Spectroscopy (OES) signals. This method controls the plasma beam by calibrating the flow rate of the etching gas and monitoring the corresponding emitted light from the plasma discharge.

Career Highlights: Currently, Hsieh works at Taiwan Semiconductor Manufacturing Company Ltd. (TSMC), a leading company in the semiconductor industry known for its innovative technologies and manufacturing processes. Hsieh's work at TSMC highlights his dedication to pushing the boundaries of semiconductor fabrication methods.

Collaborations: Throughout his career, Hsieh has collaborated with talented colleagues, including Cha-Hsin Chao and Yi-Wei Chiu. These collaborations have played a crucial role in advancing research and innovations in semiconductor processing.

Conclusion: As a key innovator in the semiconductor realm, Yi-Tsang Hsieh's contributions through his patents have significantly impacted semiconductor manufacturing techniques. His work not only showcases his scientific expertise but also demonstrates the importance of collaboration in fostering technological advancements in this dynamic industry.

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