Yi-Ling Chan

Title: Innovations of Yi-Ling Chan in Semiconductor Technology

Introduction

Yi-Ling Chan is a prominent inventor based in Miaoli, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced device structures. With a total of 6 patents to his name, Chan's work has been instrumental in enhancing the performance and reliability of semiconductor devices.

Latest Patents

One of Yi-Ling Chan's latest patents is a method of fabricating a necked FINFET device. This innovative approach involves creating a double gate, FINFET device structure in a silicon on insulator layer. The channel region is defined with a narrowed shape, and a composite insulator spacer is formed on the sides of the device structure. The process includes anisotropic RIE procedures to shape the FINFET device structure, followed by the growth of a silicon dioxide gate insulator layer. A gate structure is then fabricated, traversing the device structure and overlying the gate insulator layer. After forming a source/drain region, composite insulator spacers are added, resulting in a FINFET device structure with a narrow channel region.

Another notable patent addresses the issue of electrostatic discharge (ESD) protection. Chan's invention includes a region with very high defect density within the drain of the ESD protection device. This design prevents gate oxide damage from electrostatic discharges. When low voltages are applied, no action occurs, but at high voltages, the depletion layer grows wide enough to touch the high defect density region, allowing substantial current flow into the substrate. This innovative solution effectively lowers the voltage to a safe level.

Career Highlights

Yi-Ling Chan is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to push the boundaries of semiconductor technology. His expertise and innovative mindset have led to numerous advancements in the field, making him a valuable asset to the company.

Collaborations

Chan has collaborated with notable colleagues, including Fu-Liang Yang and Kuo-Nan Yang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Yi-Ling Chan's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the industry. His innovative methods and solutions continue to shape the future of semiconductor devices.