Singapore, Singapore

Yi-Kun Chen

This inventor holds 2 USPTO granted patents. Top assignee: United Microelectronics Corp.. Active years: 2013-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yi-Kun Chen. Retrieved from https://idiyas.com/inventor/yi-kun-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

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Company Filing History:


Years Active: 2013-2014

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2 patents (USPTO):Explore Patents

Title: Yi-Kun Chen: Innovator in Semiconductor Technology

Introduction

Yi-Kun Chen is a prominent inventor based in Singapore, known for his contributions to semiconductor technology. With a total of 2 patents, he has made significant strides in the field, particularly in the fabrication methods of semiconductor devices.

Latest Patents

Yi-Kun Chen's latest patents include innovative methods for semiconductor device fabrication. The first patent, titled "Semiconductor device and fabrication method thereof," outlines a process that begins with the provision of a first dummy gate, which includes a first high-k gate insulator layer, a first composite sacrificial layer, and a first dummy gate electrode. The method involves removing the first dummy gate electrode to expose the first composite sacrificial layer, followed by its removal. Subsequently, a first work function layer is formed on the first high-k gate insulator layer, culminating in the formation of a first metal gate electrode.

The second patent, "Semiconductor structure and fabricating method thereof," describes a method for fabricating a semiconductor structure. This process starts with a substrate that has a dielectric layer with openings exposing portions of the substrate. A gate dielectric layer, consisting of a high-k dielectric layer and a barrier layer, is formed at the bottoms of these openings. A sacrificial layer is then added, followed by the formation of a first work function metal layer. The method concludes with the removal of specific portions of the first work function metal layer and the sacrificial layer.

Career Highlights

Yi-Kun Chen is currently employed at United Microelectronics Corporation, where he continues to advance semiconductor technologies. His work has been instrumental in developing efficient fabrication methods that enhance the performance and reliability of semiconductor devices.

Collaborations

Throughout his career, Yi-Kun Chen has collaborated with notable colleagues, including Duan-Quan Liao and Shih-Chieh Hsu. These collaborations have fostered innovation and contributed to the success of various projects within the semiconductor industry.

Conclusion

Yi-Kun Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor fabrication methods, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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