Company Filing History:
Years Active: 2000-2003
Title: Yi-Hua Chin: Innovator in Chemical Mechanical Polishing Technology
Introduction
Yi-Hua Chin is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 4 patents. His work focuses on enhancing the efficiency and effectiveness of polishing apparatuses and inspection devices.
Latest Patents
One of Yi-Hua Chin's latest patents is a "Chemical mechanical polishing apparatus with stable signals." This invention features multiple electric machines that execute mechanical polishing motions. It includes at least two control systems to manage these motions and two signal wires for transmitting signals between the control systems. Additionally, a wave filter is incorporated to filter out signals exceeding a predetermined voltage.
Another notable patent is the "Inspection device for examining a piece of aperture graphite of an extraction electrode." This device is designed to assess the suitability of aperture graphite by comparing a to-be-examined curve with a standard curve marked on a sidewall surface. The examination engagement portion ensures a predetermined positional relationship, allowing for accurate evaluations based on the differences between the projected curves.
Career Highlights
Yi-Hua Chin is currently employed at Mosel Vitelic Corporation, where he continues to innovate in his field. His work has significantly impacted the development of advanced polishing technologies, making him a key figure in the industry.
Collaborations
Throughout his career, Yi-Hua Chin has collaborated with talented individuals such as Dong-Tay Tsai and Chun-chieh Lee. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Yi-Hua Chin's contributions to the field of chemical mechanical polishing are noteworthy. His patents reflect a commitment to advancing technology and improving industrial processes. His work continues to influence the industry and inspire future innovations.