The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2003
Filed:
Jul. 28, 2000
Applicant:
Inventors:
Yi-Hua Chin, Taipei, TW;
Hua-Jen Tseng, Chu-Pei, TW;
Chun-Chieh Lee, Hsinchu Hsien, TW;
Dong-Tay Tsai, Kaohsiung, TW;
Assignee:
Mosel Vitelic Inc., Hsinchu, TW;
Primary Examiner:
Int. Cl.
CPC ...
B24B 4/900 ; B24B 5/100 ;
U.S. Cl.
CPC ...
B24B 4/900 ; B24B 5/100 ;
Abstract
A chemical mechanical polishing apparatus has a plurality of electric machines for executing mechanical polishing motions, at least two control systems for controlling the mechanical polishing motions, at least two signal wires connected with the two control systems for transmitting signals of the two control systems, and a wave filter comprising two terminals connected with the two signal wires respectively for filtering out the signal whose voltage exceeds a predetermined value in the two signal wires.