The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2002

Filed:

Dec. 21, 1999
Applicant:
Inventors:

Chun-chieh Lee, Pao-Shun, TW;

Hua-jen Tseng, Chu-Pei, TW;

Dong-tay Tsai, Kaohsiung, TW;

Yi-hua Chin, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 3/20 ; G01B 1/00 ; G01B 3/00 ; G01B 5/00 ; G01B 5/20 ;
U.S. Cl.
CPC ...
G01B 3/20 ; G01B 1/00 ; G01B 3/00 ; G01B 5/00 ; G01B 5/20 ;
Abstract

An inspection device for examining a piece of aperture graphite of an extraction electrode, and the aperture graphite includes a to-be-examined curve and a to-be-examined engagement portion. The inspection device includes a sidewall surface having a standard curve marked thereon, and an examination engagement portion having a predetermined positional relationship with the sidewall surface. After the to-be-examined engagement portion is engaged with the examination engagement portion, and after the to-be-examined curve is projected onto the sidewall surface, the suitability of the aperture graphite can be determined according to the amount of differences between the projected to-be-examined curve and the standard curve.


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