Yi Fu Chung

Title: Yi Fu Chung: Innovator in Semiconductor Technology

Introduction

Yi Fu Chung is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on innovative methods for improving semiconductor fabrication processes.

Latest Patents

Among his latest patents is a method for forming a gate structure through an amorphous silicon layer. This fabrication method involves providing a substrate layer and forming an amorphous silicon layer of a selected thickness at a reaction temperature between about 520°C and 560°C. Additionally, he has developed a wafer and its manufacturing and reclaiming methods. This invention includes a semiconductor substrate with a protective layer, which prevents damage during the reclaiming process and increases the reclaiming rate of the wafer.

Career Highlights

Yi Fu Chung is currently employed at Mosel Vitelic Corporation, where he continues to advance semiconductor technologies. His expertise in the field has led to numerous innovations that enhance the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

He has collaborated with notable coworkers, including Jen Chieh Chang and Pei-Feng Sun, contributing to various projects that push the boundaries of semiconductor research and development.

Conclusion

Yi Fu Chung's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field significantly.