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For the Inventor, By the Inventor

Hsinchu, Taiwan

Yi Fu Chung

This inventor holds 6 USPTO granted patents. Top assignee: Mosel Vitelic Corporation. Active years: 2002-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yi Fu Chung. Retrieved from https://idiyas.com/inventor/yi-fu-chung-lcka4z2b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Taoyuan, TW (2002)
  • Hsinchu, TW (2006 - 2009)

Company Filing History:

goldMedal6 out of 443 
 
Mosel Vitelic Corporation
 patents

Years Active: 2002-2009

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6 patents (USPTO):Explore Patents
1. 7592240 - Method for forming a gate structure through an amorphous silicon layer and applications thereof (2009-09-22),
2. 7432204 - Wafer and the manufacturing and reclaiming methods thereof (2008-10-07),
3. 7282429 - Method of manufacturing Schottky diode device (2007-10-16),
4. 7211523 - Method for forming field oxide (2007-05-01),
5. 6991994 - Method of forming rounded corner in trench (2006-01-31),
6. 6492248 - Few-particle-induced low-pressure TEOS process (2002-12-10),

Title: Yi Fu Chung: Innovator in Semiconductor Technology

Introduction

Yi Fu Chung is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on innovative methods for improving semiconductor fabrication processes.

Latest Patents

Among his latest patents is a method for forming a gate structure through an amorphous silicon layer. This fabrication method involves providing a substrate layer and forming an amorphous silicon layer of a selected thickness at a reaction temperature between about 520°C and 560°C. Additionally, he has developed a wafer and its manufacturing and reclaiming methods. This invention includes a semiconductor substrate with a protective layer, which prevents damage during the reclaiming process and increases the reclaiming rate of the wafer.

Career Highlights

Yi Fu Chung is currently employed at Mosel Vitelic Corporation, where he continues to advance semiconductor technologies. His expertise in the field has led to numerous innovations that enhance the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

He has collaborated with notable coworkers, including Jen Chieh Chang and Pei-Feng Sun, contributing to various projects that push the boundaries of semiconductor research and development.

Conclusion

Yi Fu Chung's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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