Yeurui Chen

Title: Yeurui Chen: Innovator in Plasma Processing Technology

Introduction

Yeurui Chen is a notable inventor based in Milpitas, California. He has made significant contributions to the field of plasma processing through his innovative work. His expertise is reflected in his patent, which addresses critical aspects of surface reactions during plasma processing.

Latest Patents

Yeurui Chen holds a patent titled "System and method to adjust a kinetics model of surface reactions during plasma processing." This patent describes a system that includes a metrology tool designed to acquire measurements of a sample. The system features a controller with processors that execute program instructions to generate a surface kinetics model output. It determines the expected response of this model to polarized light and compares it to the acquired measurements. The system then generates metrics based on this comparison, adjusts parameters of the surface kinetics model, and applies the adjusted model to simulate on-sample performance during plasma processing. This innovation is crucial for enhancing the efficiency and accuracy of plasma processing techniques.

Career Highlights

Yeurui Chen is currently employed at Kla Corporation, where he continues to develop and refine technologies related to plasma processing. His work at Kla Corporation has positioned him as a key player in advancing the capabilities of metrology tools and surface kinetics modeling.

Collaborations

Yeurui Chen collaborates with talented professionals in his field, including Ankur Agarwal and Chad Huard. These collaborations enhance the innovative environment at Kla Corporation and contribute to the development of cutting-edge technologies.

Conclusion

Yeurui Chen's contributions to plasma processing technology through his patent and work at Kla Corporation highlight his role as an influential inventor. His innovative approaches are paving the way for advancements in the industry.