Yen-Pu Chen

Title: Yen-Pu Chen: Innovator in Photomask Technology

Introduction

Yen-Pu Chen is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His work is characterized by innovative methods and designs that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Yen-Pu Chen's latest patents include a novel photomask design. This invention provides a photomask that comprises a substrate with defined regions, including a first region, a second region, and a third region. The third region is strategically placed between the first and second regions. The patterned layer on the substrate includes distinct patterned layers for each region, with specific thickness variations. Additionally, he has developed a method for monitoring fin removal. This method involves a substrate with first and second regions, where fins extend in perpendicular directions. The process includes forming a material layer to cover the fins and patterning them for simultaneous removal, allowing for effective monitoring of fin features.

Career Highlights

Yen-Pu Chen is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his innovative ideas in practical applications, contributing to advancements in technology.

Collaborations

Yen-Pu Chen has collaborated with talented coworkers, including Tang-Chun Weng and Chia-Ching Lin. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Yen-Pu Chen's contributions to photomask technology and his innovative methods for monitoring fin removal highlight his role as a significant inventor in the semiconductor field. His work continues to influence advancements in technology and manufacturing processes.