Yen-Hsin Liu

Title: Innovations of Yen-Hsin Liu in Semiconductor Manufacturing

Introduction

Yen-Hsin Liu is a notable inventor based in New Taipei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of four patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor device production.

Latest Patents

Yen-Hsin Liu's latest patents include a method of manufacturing a semiconductor device that involves depositing a photoresist material over a substrate. This method includes rotating the substrate to spread the photoresist material and blowing gas to the edge of the substrate during rotation. The process is carefully controlled, with the rotation and gas blowing being stopped at specific intervals. Another patent describes a method where underlying structures, including gate electrodes and source/drain epitaxial layers, are formed. This method involves creating multiple layers over these structures, forming a hard mask layer, and patterning the resist layers to create a first hard mask pattern, which is then used to pattern the hard mask layer itself.

Career Highlights

Yen-Hsin Liu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to the advancement of semiconductor technologies.

Collaborations

Yen-Hsin Liu has collaborated with notable colleagues, including Kewei Zuo and Chien Rhone Wang, who is a woman. These collaborations have further enriched his work and contributed to the development of new technologies in the semiconductor field.

Conclusion

Yen-Hsin Liu's contributions to semiconductor manufacturing through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence advancements in technology and manufacturing processes.