Yen-Hao Liao

Title: Yen-Hao Liao: Innovator in Dielectric Layer Technology

Introduction

Yen-Hao Liao is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of dielectric layers and interconnection structures.

Latest Patents

Yen-Hao Liao holds two notable patents. The first patent is titled "Dielectric layer, interconnection structure using the same, and manufacturing method thereof." This invention describes a structure that includes a first dielectric film and a second dielectric film. The second dielectric film is formed on and in contact with the first dielectric film, where a first pore is created between the two films. Notably, the thickness of the first dielectric film is smaller than the diameter of the first pore. The second patent also focuses on a similar theme, detailing a method for manufacturing a dielectric layer. This method involves forming a first dielectric film over a substrate, depositing a first porogen over the first dielectric film, and then forming a second dielectric film on and in contact with both the first dielectric film and the first porogen. The first porogen is subsequently removed, completing the process.

Career Highlights

Yen-Hao Liao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to push the boundaries of technology and innovation in semiconductor manufacturing.

Collaborations

Yen-Hao has collaborated with several talented individuals, including Yi-Chen Ho and You-Hua Chou, who is a notable woman in the field. Their teamwork has contributed to advancements in semiconductor technologies.

Conclusion

Yen-Hao Liao's innovative work in dielectric layer technology and his contributions to the semiconductor industry highlight his role as a key inventor. His patents reflect significant advancements that may influence future developments in the field.