Yee Chong Loke

Title: Innovations of Yee Chong Loke

Introduction

Yee Chong Loke is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor technology and optical devices. With a total of three patents to his name, Loke has made significant advancements in methods for forming films and high electron mobility transistors.

Latest Patents

One of his latest patents is titled "Method of forming a film with a lenticular lens array." This invention outlines a process that involves providing a substrate and a mold with a plurality of nano-scale to micro-scale cavities. The method allows for the formation of a lenticular lens array by enabling portions of the substrate to partially fill these cavities. Another significant patent is the "Self-aligning source, drain and gate process for III-V nitride MISHEMTs." This patent presents a method for fabricating high electron mobility transistor (HEMT) semiconductor devices, which includes growing a HEMT layer structure on a substrate and forming source, drain, and gate electrodes using a single lithographic mask.

Career Highlights

Yee Chong Loke has worked with prominent organizations such as the Agency for Science, Technology and Research and Temasek Polytechnic. His experience in these institutions has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Loke has collaborated with several professionals in his field, including Lakshmi Kanta Bera and Surani Bin Dolmanan, who is a woman. These collaborations have likely enriched his work and led to further advancements in his projects.

Conclusion

Yee Chong Loke's innovative patents and career achievements highlight his significant role in advancing technology in Singapore. His work continues to influence the fields of optics and semiconductor devices.