The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2021

Filed:

Nov. 21, 2018
Applicants:

Agency for Science, Technology and Research, Singapore, SG;

Temasek Polytechnic, Singapore, SG;

Inventors:

Beng Soon Tan, Singapore, SG;

Chee Fatt Frank Chan, Singapore, SG;

Yun Xu, Singapore, SG;

Bee Khuan Jaslyn Law, Singapore, SG;

Yee Chong Loke, Singapore, SG;

Hong Yee Low, Singapore, SG;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); G02B 27/22 (2018.01); G02B 30/27 (2020.01);
U.S. Cl.
CPC ...
G02B 30/27 (2020.01); G02B 3/0031 (2013.01);
Abstract

According to one aspect of the invention, there is provided a method of forming a film with a lenticular lens array, the method comprising providing a substrate; providing a mold having a plurality of nano-scale to micro-scale cavities that form the lenticular lens array on the substrate; having the mold contact the substrate; and forming the lenticular lens array by allowing portions of the substrate to partially fill the plurality of cavities.


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