Tokyo, Japan

Yasutomo Tanaka

USPTO Granted Patents = 7 


 

Average Co-Inventor Count = 4.7

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Yokohama, JP (2015)
  • Tokyo, JP (2014 - 2023)

Company Filing History:


Years Active: 2014-2023

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7 patents (USPTO):Explore Patents

Title: Yasutomo Tanaka: Innovator in Composite Materials and Chlorosilane Polymers

Introduction

Yasutomo Tanaka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of composite materials and chemical vapor deposition methods. With a total of 7 patents to his name, Tanaka's work has had a considerable impact on various industrial applications.

Latest Patents

Tanaka's latest patents include a production method for composite material and a method for stabilizing chlorosilane polymer. The production method for composite material involves creating a silicon carbide film on a porous substrate by causing a silicon source, a chlorine source, and a carbon source to react. This innovative approach enhances the properties of the composite material. The method for stabilizing chlorosilane polymer focuses on preventing the generation of solid chlorosilane polymers. It includes steps to bring alcohol into contact with the chlorosilane polymer, leading to its degradation and subsequent hydrolysis.

Career Highlights

Throughout his career, Yasutomo Tanaka has worked with notable companies such as IHI Corporation and Ishikawajima-Harima Heavy Industries Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques in material science.

Collaborations

Tanaka has collaborated with talented individuals in his field, including Takeshi Nakamura and Yuuta Ootsuka. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Yasutomo Tanaka's contributions to the fields of composite materials and chlorosilane polymers demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to solving complex challenges in material science.

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