logo

For the Inventor, By the Inventor

Fujisawa, Japan

Yasushi Kawasumi

This inventor holds 11 USPTO granted patents and 3 published patent applications. Top assignee: Canon Kabushiki Kaisha. Active years: 1995-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasushi Kawasumi. Retrieved from https://idiyas.com/inventor/yasushi-kawasumi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11 

% Patents Active = 100.0

Average Co-Inventor Count = 3.8

ph-index = 7

Forward Citations = 188(Granted Patents)


Company Filing History:

goldMedal11 out of 93,085 
 
Canon Kabushiki Kaisha
 patents

Years Active: 1995-2002

Loading Chart...
11 patents (USPTO):Explore Patents
1. 6475563 - Method for forming a thin film using a gas (2002-11-05),
2. 6329265 - Method of making a semiconductor device using processing from both sides of a workpiece (2001-12-11),
3. 6156657 - Method of treating active material (2000-12-05),
4. 6143190 - Method of producing a through-hole, silicon substrate having a (2000-11-07),
5. 6004885 - Thin film formation on semiconductor wafer (1999-12-21),
6. 5952694 - Semiconductor device made using processing from both sides of a workpiece (1999-09-14),
7. 5776255 - Chemical vapor deposition apparatus (1998-07-07),
8. 5580822 - Chemical vapor deposition method (1996-12-03),
9. 5534069 - Method of treating active material (1996-07-09),
10. 5476815 - Manufacturing method of semiconductor device (1995-12-19),
11. 5447568 - Chemical vapor deposition method and apparatus making use of liquid (1995-09-05),

Title: Yasushi Kawasumi: Innovator in Semiconductor Technology

Introduction

Yasushi Kawasumi is a prominent inventor based in Fujisawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work focuses on innovative methods for forming thin films and semiconductor devices.

Latest Patents

One of his latest patents is a method for forming a thin film using a gas. This method involves providing a substrate in a reaction chamber, where a head for emitting gas is positioned opposite the substrate. The process includes mounting a detachable gas liberating surface to the head, ensuring that the distance between the head and the substrate surface is 10 mm or less. Gas is then emitted from the head into the reaction chamber to facilitate the thin film formation.

Another notable patent is related to the method of making a semiconductor device using processing from both sides of a workpiece. This invention describes a semiconductor device that features a semiconductor layer formed on a substrate with an insulating surface. It includes a first region processed from one major surface and a second region processed from the opposite major surface, allowing both regions to work together to create a semiconductor function element or isolation region.

Career Highlights

Yasushi Kawasumi is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His innovative work has positioned him as a key figure in the development of advanced semiconductor technologies.

Collaborations

Throughout his career, Kawasumi has collaborated with notable coworkers, including Kenji Makino and Yuzo Kataoka. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Yasushi Kawasumi's contributions to semiconductor technology through his innovative patents highlight his expertise and dedication to the field. His work continues to influence advancements in technology and the development of new semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…