The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1996
Filed:
May. 25, 1995
Applicant:
Inventors:
Yukihiro Hayakawa, Atsugi, JP;
Yasushi Kawasumi, Fujisawa, JP;
Kenji Makino, Yokohama, JP;
Yuzo Kataoka, Atsugi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437187 ; 118715 ; 118724 ; 427576 ; 117 83 ;
Abstract
A starting gas feeding apparatus for forming a gaseous starting material from a liquid starting material and feeding the gaseous starting material into a reaction chamber of a CVD apparatus, comprises; a container that holds the liquid starting material, pressure reducing means for reducing the pressure inside the container, and heating means for heating the liquid starting material held in the container; the liquid starting material being boiled.
Hayakawa, Yukihiro. (1996). Chemical vapor deposition method (U.S. Patent No. 5580822). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5580822
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