The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2002
Filed:
Nov. 04, 1999
Applicant:
Inventors:
Yukihiro Hayakawa, Atsugi, JP;
Yasushi Kawasumi, Fujisawa, JP;
Kenji Makino, Yokohama, JP;
Yuzo Kataoka, Atsugi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/6455 ;
U.S. Cl.
CPC ...
C23C 1/6455 ;
Abstract
A method for forming a thin film on a substrate using a gas includes providing a substrate in a reaction chamber. A head for emitting a gas in the reaction chamber is disposed opposite the substrate. This step includes mounting a detachable gas liberating surface to the head so that the distance between the head and the substrate surface is 10 mm or less. Gas is then emitted from the head into the reaction chamber.
Hayakawa, Yukihiro. (2002). Method for forming a thin film using a gas (U.S. Patent No. 6475563). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6475563
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile