IDiyas

For the Inventor, By the Inventor

Nirasaki, Japan

Yasushi Fujii

USPTO Granted Patents = 11


Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Yamanashi, JP (2019 - 2020)
  • Nirasaki, JP (2009 - 2023)
  • Nirasaki Yamanashi, JP (2023)

Company Filing History:

goldMedal10 out of 10,295 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 101 
 
Tokyo Electron Limi Ted
 patents

Years Active: 2009-2023

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11 patents (USPTO):
1. 11732357 - Substrate processing method and substrate processing apparatus (2023-08-22),
2. 11551933 - Substrate processing method and substrate processing apparatus (2023-01-10),
3. 11499225 - Gas processing apparatus and gas processing method (2022-11-15),
4. 11248293 - Film-forming apparatus and film-forming method (2022-02-15),
5. 10864548 - Film forming method and film forming apparatus (2020-12-15),
6. 10340176 - Substrate mounting method and substrate mounting device (2019-07-02),
7. 10333062 - Substrate liquid processing method, substrate liquid processing apparatus, and storage medium (2019-06-25),
8. 9111967 - Liquid processing method, liquid processing apparatus and storage medium (2015-08-18),
9. 8475668 - Substrate liquid processing apparatus, substrate liquid processing method, and storage medium having substrate liquid processing program stored therein (2013-07-02),
10. 7902077 - Semiconductor device manufacturing method that recovers damage of the etching target while supplying a predetermined recovery gas (2011-03-08),
11. 7482281 - Substrate processing method (2009-01-27),

Title: Yasushi Fujii: Innovator in Substrate Processing Technology

Introduction

Yasushi Fujii is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing, holding a total of 11 patents. His innovative approaches have advanced the technology used in various applications.

Latest Patents

Fujii's latest patents include a substrate processing method and apparatus that involves a repeating cycle. This cycle consists of supplying source gas into a process container, allowing it to be adsorbed to the substrate, and then exhausting the excess gas. Additionally, he has developed methods for forming a seed layer on a substrate and creating metal-containing films through precise temperature control and gas supply.

Career Highlights

Throughout his career, Yasushi Fujii has worked with notable companies, including Tokyo Electron Limited. His expertise in substrate processing has positioned him as a key figure in the industry, contributing to advancements that enhance manufacturing processes.

Collaborations

Fujii has collaborated with talented individuals such as Yu Nunoshige and Hirotaka Kuwada. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Yasushi Fujii's work in substrate processing technology exemplifies his commitment to innovation and excellence. His contributions continue to influence the industry and pave the way for future advancements.

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