The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Oct. 12, 2010
Hiroshi Tanaka, Koshi, JP;
Teruomi Minami, Koshi, JP;
Yosuke Kawabuchi, Koshi, JP;
Norihiro Ito, Koshi, JP;
Fumihiro Kamimura, Koshi, JP;
Takashi Yabuta, Koshi, JP;
Kazuki Kosai, Beaverton, OR (US);
Takeshi Uno, Koshi, JP;
Kenji Sekiguchi, Nirasaki, JP;
Yasushi Fujii, Nirasaki, JP;
Hiroshi Tanaka, Koshi, JP;
Teruomi Minami, Koshi, JP;
Yosuke Kawabuchi, Koshi, JP;
Norihiro Ito, Koshi, JP;
Fumihiro Kamimura, Koshi, JP;
Takashi Yabuta, Koshi, JP;
Kazuki Kosai, Beaverton, OR (US);
Takeshi Uno, Koshi, JP;
Kenji Sekiguchi, Nirasaki, JP;
Yasushi Fujii, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Provided are a substrate liquid processing apparatus, a substrate liquid processing method, and a computer readable storage medium having a substrate liquid processing program stored therein that can prevent the occurrence of the electrostatic breakdown caused by the discharge of electric charges in a substrate. The substrate liquid processing apparatus processes a circuit-forming surface of the substrate with a chemical liquid. Furthermore, prior to processing the substrate with the chemical liquid, the substrate liquid processing apparatus performs an anti-static process for an surface opposite to the circuit-forming surface of the substrate by an anti-static liquid, thereby emitting the electric charges on the substrate.