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For the Inventor, By the Inventor

Funabashi, Japan

Yasuo Kawamura

USPTO Granted Patents = 19


Average Co-Inventor Count = 6.9

ph-index = 8

Forward Citations = 144(Granted Patents)


Location History:

  • Chiba, JP (1996)
  • Funabashi, JP (1983 - 2010)

Company Filing History:

goldMedal19 out of 1,235 
 
Nissan Chemical Industries Limited
 patents

Years Active: 1983-2010

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19 patents (USPTO):Explore Patents
1. 7846638 - Composition for forming anti-reflective coating for use in lithography (2010-12-07),
2. 7425399 - Composition for forming anti-reflective coating for use in lithography (2008-09-16),
3. 6642401 - &bgr;-diketonatocopper(I) complex containing allene compounds as ligand and process for producing the same (2003-11-04),
4. 6197728 - Quinoxaline derivatives and herbicidal composition (2001-03-06),
5. 5977027 - Pyrimidone isobutyric acid and herbicides containing the same (1999-11-02),
6. 5834401 - Nitrogen-containing cyclic compounds and herbicides containing the same (1998-11-10),
7. 5518994 - 2-arylaminopyrimidinone derivative, and herbicide and plant growth (1996-05-21),
8. 5416236 - Aniline derivatives and process for producing the same (1995-05-16),
9. 5364831 - Quinoxaline derivatives and herbicidal composition (1994-11-15),
10. 5356863 - Uracil derivatives (1994-10-18),
11. 5278163 - Pyridazinone derivatives and compositions for controlling and/or (1994-01-11),
12. 4945091 - 3(2H)-pyridazinone compounds derivatives and compositions for (1990-07-31),
13. 4910201 - 3(2H)-pyridazinone derivatives, and their uses in insecticidal (1990-03-20),
14. 4906627 - Pyridazinone derivatives, and insecticidal, acaricidal and nematicidal (1990-03-06),
15. 4874861 - Pyridazinone derivatives, preparation thereof, and insecticidal, (1989-10-17),

Title: **Yasuo Kawamura: Innovator in Anti-Reflective Coatings**

Introduction

Yasuo Kawamura, based in Funabashi, Japan, is a prominent inventor known for his contributions to the field of anti-reflective coatings, particularly for semiconductor manufacturing. With a robust portfolio of 19 patents, Kawamura has established himself as a valuable asset in the innovative landscape of chemical engineering.

Latest Patents

Kawamura's most recent patents include a composition for forming anti-reflective coatings used in lithography. This innovative composition offers excellent light absorption at wavelengths critical for semiconductor device fabrication. It provides a high level of protection against light reflection and features an increased dry etching rate when compared to traditional photoresist layers. The formulation typically includes a triazine trione compound, along with oligomer or polymer compounds featuring hydroxyalkyl structures as substitutes on nitrogen atoms, which enhances its efficacy.

Career Highlights

Currently, Yasuo Kawamura is employed at Nissan Chemical Industries Limited, where he continues to drive advancements in chemical compositions for various applications. His work not only advances the technology utilized in semiconductor manufacturing but also contributes significantly to the overall efficiency and effectiveness of lithographic processes.

Collaborations

Throughout his career, Kawamura has collaborated with esteemed colleagues, such as Tomoyuki Ogura and Kiminori Hirata. These partnerships have facilitated the exchange of ideas and expertise, fostering a creative environment that has led to innovative breakthroughs in their respective fields.

Conclusion

Yasuo Kawamura's dedication to innovation in the realm of anti-reflective coatings underscores his importance as an inventor in the semiconductor industry. His ongoing research and development efforts continue to pave the way for advancements that enhance manufacturing processes, demonstrating a lasting impact on technology.

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