The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2008
Filed:
Oct. 08, 2003
Takahiro Kishioka, Nei-gun, JP;
Ken-ichi Mizusawa, Chiyoda-ku, JP;
Tomoyuki Enomoto, Nei-gun, JP;
Rikimaru Sakamoto, Nei-gun, JP;
Keisuke Nakayama, Nei-gun, JP;
Yasuo Kawamura, Funabashi, JP;
Takahiro Kishioka, Nei-gun, JP;
Ken-ichi Mizusawa, Chiyoda-ku, JP;
Tomoyuki Enomoto, Nei-gun, JP;
Rikimaru Sakamoto, Nei-gun, JP;
Keisuke Nakayama, Nei-gun, JP;
Yasuo Kawamura, Funabashi, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.