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Keisuke Nakayama

USPTO Granted Patents = 8

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 16(Granted Patents)

Location History:

Toyama-ken, JP (1999)
Toyama, JP (2009 - 2010)
Nei-gun, JP (2001 - 2011)

Company Filing History:

Nissan Chemical Industries Limited

Years Active: 1999-2011

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8 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7947424 - Composition for forming anti-reflective coat (2011-05-24),

2. 7846638 - Composition for forming anti-reflective coating for use in lithography (2010-12-07),

3. 7795369 - Sulfur atom-containing anti-reflective coating forming composition for lithography (2010-09-14),

4. 7501229 - Anti-reflective coating containing sulfur atom (2009-03-10),

5. 7425399 - Composition for forming anti-reflective coating for use in lithography (2008-09-16),

6. 6458870 - Process for preparing an aqueous solution of sulfanilic acid modified melamine-formaldehyde resin and a cement composition (2002-10-01),

7. 6214965 - Process for preparing an aqueous solution of sulfanilic acid modified melamine-formaldehyde resin and a cement composition (2001-04-10),

8. 5998573 - Amino resin composition (1999-12-07),

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