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For the Inventor, By the Inventor

Fujisawa, Japan

Yasukazu Mase

This inventor holds 19 USPTO granted patents. Top assignees: Kabushiki Kaisha Toshiba, Toshiba Kikai Kabushiki Kaisha. Active years: 1986-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasukazu Mase. Retrieved from https://idiyas.com/inventor/yasukazu-mase

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 19

% Patents Active = 100.0

Average Co-Inventor Count = 2.9

ph-index = 10

Forward Citations = 320(Granted Patents)


Location History:

  • Tokyo, JP (1986 - 1992)
  • Fujisawa, JP (1990 - 1996)
  • Yokohama, JP (1997 - 2000)
  • Fuyisawa, JP (2001)

Company Filing History:

goldMedal19 out of 53,262 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal1 out of 746 
 
Toshiba Kikai Kabushiki Kaisha
 patents
where one patent can have more than one assignee

Years Active: 1986-2001

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19 patents (USPTO):Explore Patents
1. RE37059 - Wiring pattern of semiconductor integrated circuit device (2001-02-20),
2. 6015754 - Chemical mechanical polishing apparatus and method (2000-01-18),
3. 5655954 - Polishing apparatus (1997-08-12),
4. 5523627 - Wiring pattern of semiconductor integrated circuit device (1996-06-04),
5. 5411916 - Method for patterning wirings of semiconductor integrated circuit device (1995-05-02),
6. 5258328 - Method of forming multilayered wiring structure of semiconductor device (1993-11-02),
7. 5175115 - Method of controlling metal thin film formation conditions (1992-12-29),
8. 5169407 - Method of determining end of cleaning of semiconductor manufacturing (1992-12-08),
9. 5126819 - Wiring pattern of semiconductor integrated circuit device (1992-06-30),
10. 5103287 - Multi-layered wiring structure of semiconductor integrated circuit device (1992-04-07),
11. 5100476 - Method and apparatus for cleaning semiconductor devices (1992-03-31),
12. 5055906 - Semiconductor device having a composite insulating interlayer (1991-10-08),
13. 5044311 - Plasma chemical vapor deposition apparatus (1991-09-03),
14. 5016663 - Method of determining end of cleaning of semiconductor manufacturing (1991-05-21),
15. 4952528 - Photolithographic method for manufacturing semiconductor wiring patterns (1990-08-28),

Title: Yasukazu Mase: Innovator in Semiconductor Technology

Introduction

Yasukazu Mase is a prominent inventor based in Fujisawa, Japan, renowned for his contributions to semiconductor technology. With a remarkable portfolio of 19 patents, Mase has made significant strides in improving the efficiency and functionality of semiconductor devices.

Latest Patents

Among Mase's latest inventions is a wiring pattern for semiconductor integrated circuit devices. This design includes a wiring portion extending from a connection hole and features a connection portion that is deliberately formed wider than a predetermined matching allowance. This innovation ensures a required yield of successful matching, enhancing the reliability of semiconductor connections.

Another significant patent from Mase is a chemical mechanical polishing (CMP) apparatus and method. This technology is pivotal in the semiconductor manufacturing process, involving the polishing of a target surface on a semiconductor wafer. The method balances the movement of the target surface and the polishing cloth while simultaneously supplying a polishing liquid. Electric resistance measurements between specified points on the target surface help ascertain the end-point of the polishing treatment, improving efficiency and outcome predictability.

Career Highlights

Throughout his career, Yasukazu Mase has been associated with notable companies such as Toshiba Corporation and Toshiba Kikai Corporation. His work has not only advanced his professional trajectory but also contributed significantly to the fields of semiconductor technology and engineering.

Collaborations

Mase has collaborated with esteemed colleagues, including Masahiro Abe and Tomie Yamamoto, contributing to a collaborative environment that fosters innovation and technological advancement. Their joint efforts have been vital in pushing the boundaries of what is possible in semiconductor technology.

Conclusion

Yasukazu Mase's innovative spirit and dedication to semiconductor technology have led to numerous advancements through his patents. His work demonstrates a commitment to enhancing the effectiveness of semiconductor devices, making a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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