Yariv Simovitch

Title: Yariv Simovitch: Semiconductor Inspection and Measurement Innovations.

Introduction

Yariv Simovitch is an inventor based in Rehovot, Israel. His patent work addresses semiconductor measurement and wafer inspection, including techniques for profiling semiconductor structures and detecting defects across multiple dies. He is associated with Applied Materials Israel Limited and is credited with 4 patents.

Latest Patents

“Depth Profiling of Semiconductor Structures Using Multi-Wavelength Pump-Probe Technique” describes a system for profiling patterned wafer samples. It uses a pump pulse and multiple probe pulses at different wavelengths, arranged to reach the same target region simultaneously. After reflecting from the sample, the probe pulses are separated and detected individually, supporting depth analysis of the semiconductor structure.

“Die-to-Multi-Die Wafer Inspection” presents a computer-based method for collecting and analyzing scan data from patterned wafers. The method scans sets of wafer slices in sequence and performs die-to-multi-die analysis on each slice segment to identify defects. By comparing analogous sets scanned during the same operation, the approach can use data from other die-columns as references.

Career Highlights

Simovitch’s listed inventions focus on semiconductor manufacturing processes that depend on precise measurement and inspection. His work combines optical techniques for examining wafer structures with data-analysis methods for identifying defects across dies.

Collaborations

Simovitch is associated with Applied Materials Israel Limited. His listed coworkers include Ido Almog and Guy Shwartz.

Conclusion

Yariv Simovitch’s patent portfolio reflects contributions to semiconductor profiling and wafer inspection, with methods designed to improve structural analysis and defect detection.