The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Nov. 13, 2023
Applicant:
Applied Materials Israel Ltd., Rehovot, IL;
Inventors:
Ori Golani, Kibbutz Shoval, IL;
Ido Almog, Rehovot, IL;
Yariv Simovitch, Rehovot, IL;
Guy Shwartz, Ramat-Gan, IL;
Assignee:
Applied Materials Israel Ltd., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/22 (2006.01); G01N 29/04 (2006.01); G01N 29/07 (2006.01); G01N 29/24 (2006.01);
U.S. Cl.
CPC ...
G01B 11/22 (2013.01); G01N 29/043 (2013.01); G01N 29/07 (2013.01); G01N 29/2418 (2013.01); G01B 2210/56 (2013.01); G01N 2291/2697 (2013.01);
Abstract
A systems for in-depth profiling of patterned wafer samples including a pump pulse and plurality of probe pulses each having a different wavelength (λ1-λn), and an optical setup configured to combine the plurality of probe pulses, such that they simultaneously reach the same target region of the sample and to separate the plurality of probe pulses upon their reflection from the sample, such that each of the plurality of probe pulses is detected by a separate detector.