Rehovot, Israel

Ido Almog

USPTO Granted Patents = 14 

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2017-2025

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14 patents (USPTO):Explore Patents

Title: Ido Almog: Innovator in Hybrid Metrology and Semiconductor Technologies

Introduction

Ido Almog is a prominent inventor based in Rehovot, Israel, known for his significant contributions to the fields of hybrid metrology and semiconductor technologies. With a total of 14 patents to his name, Almog has made remarkable advancements that enhance the precision and efficiency of measurement techniques in various applications.

Latest Patents

Among his latest patents, Almog has developed a method for non-destructive hybrid acousto-optic and scanning electron microscopy-based metrology. This innovative method involves obtaining measurement data from both acousto-optic and scanning electron microscopy to extract key parameters and estimate structural characteristics of inspected samples. Another notable patent focuses on depth profiling of semiconductor structures using picosecond ultrasonics. This method allows for the analysis of lateral structural features within semiconductor devices by utilizing optical pump and probe pulses to generate and detect acoustic signals.

Career Highlights

Ido Almog is currently employed at Applied Materials Israel Limited, where he continues to push the boundaries of technology through his research and development efforts. His work has not only contributed to the advancement of measurement techniques but has also played a crucial role in enhancing the performance of semiconductor devices.

Collaborations

Almog collaborates with talented professionals in his field, including Ori Golani and Haim Feldman. These partnerships foster an environment of innovation and creativity, leading to groundbreaking advancements in technology.

Conclusion

Ido Almog's contributions to hybrid metrology and semiconductor technologies exemplify the impact of innovative thinking in the scientific community. His patents and collaborative efforts continue to shape the future of measurement techniques and semiconductor applications.

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