Ido Almog

This inventor holds 15 USPTO granted patents and 5 published patent applications, primarily in Semiconductor Metrology. Top assignee: Applied Materials Israel Limited. Active years: 2017-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ido Almog. Retrieved from https://idiyas.com/inventor/ido-almog

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 15 (Patent Applications = 5)

% Patents Active = 86.7

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 7(Granted Patents)

Company Filing History:

15 out of 574

Applied Materials Israel Limited

patents

Years Active: 2017-2026

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Areas of Expertise:

Semiconductor Structures

Wafer Inspection

Depth Profiling

Multi-Perspective Analysis

Acousto-Optic Metrology

Cathodoluminescence

3D NAND Characterization

Surface Metrology

Pump-Probe Technique

Ultrasonics

Scanning Electron Microscopy

Wafer Scan Data

15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12631442 - Depth profiling of semiconductor structures using multi-wavelength pump-probe technique (2026-05-19),

2. 12278085 - Hybrid scanning electron microscopy and acousto-optic based metrology (2025-04-14),

3. 11859963 - Depth profiling of semiconductor structures using picosecond ultrasonics (2024-01-02),

4. 11815470 - Multi-perspective wafer analysis (2023-11-14),

5. 11803961 - Die-to-multi-die wafer inspection (2023-10-31),

6. 11713964 - Cathodoluminescence focal scans to characterize 3D NAND CH profile (2023-08-01),

7. 11688055 - Methods and systems for analysis of wafer scan data (2023-06-27),

8. 11662324 - Three-dimensional surface metrology of wafers (2023-05-30),

9. 11519720 - Depth profiling of semiconductor structures using picosecond ultrasonics (2022-12-06),

10. 11250560 - Methods and systems for expediting multi-perspective wafer analysis (2022-02-15),

11. 11195267 - Multi-perspective wafer analysis using an acousto-optic deflector (2021-12-07),

12. 11035803 - Multi-perspective examination of a specimen (2021-06-15),

13. 10902582 - Computerized system and method for obtaining information about a region of an object (2021-01-26),

14. 9784689 - Method and system for inspecting an object with an array of beams (2017-10-10),

15. 9535014 - Systems and methods for inspecting an object (2017-01-03),

Title: Ido Almog: Innovator in Hybrid Metrology and Semiconductor Technologies

Introduction

Ido Almog is a prominent inventor based in Rehovot, Israel, known for his significant contributions to the fields of hybrid metrology and semiconductor technologies. With a total of 14 patents to his name, Almog has made remarkable advancements that enhance the precision and efficiency of measurement techniques in various applications.

Latest Patents

Among his latest patents, Almog has developed a method for non-destructive hybrid acousto-optic and scanning electron microscopy-based metrology. This innovative method involves obtaining measurement data from both acousto-optic and scanning electron microscopy to extract key parameters and estimate structural characteristics of inspected samples. Another notable patent focuses on depth profiling of semiconductor structures using picosecond ultrasonics. This method allows for the analysis of lateral structural features within semiconductor devices by utilizing optical pump and probe pulses to generate and detect acoustic signals.

Career Highlights

Ido Almog is currently employed at Applied Materials Israel Limited, where he continues to push the boundaries of technology through his research and development efforts. His work has not only contributed to the advancement of measurement techniques but has also played a crucial role in enhancing the performance of semiconductor devices.

Collaborations

Almog collaborates with talented professionals in his field, including Ori Golani and Haim Feldman. These partnerships foster an environment of innovation and creativity, leading to groundbreaking advancements in technology.

Conclusion

Ido Almog's contributions to hybrid metrology and semiconductor technologies exemplify the impact of innovative thinking in the scientific community. His patents and collaborative efforts continue to shape the future of measurement techniques and semiconductor applications.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

5 patents pending: