The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2023

Filed:

Mar. 18, 2022
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Ido Almog, Rehovot, IL;

Ron Bar-Or, Rehovot, IL;

Lior Yaron, Rehovot, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/22 (2018.01); G01Q 60/24 (2010.01); G01N 23/2251 (2018.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); G01Q 60/24 (2013.01); G01N 2223/07 (2013.01); G01N 2223/418 (2013.01); G01N 2223/507 (2013.01); G01N 2223/6116 (2013.01);
Abstract

A computer-based method for three-dimensional surface metrology of samples based on scanning electron microscopy and atomic force microscopy. The method includes: (i) using a scanning electron microscope (SEM) to obtain SEM data of a set of sites on a surface of a sample; (ii) using an atomic force microscope (AFM) to measure vertical parameters of sites in a calibration subset of the set; (iii) calibrating an algorithm, configured to estimate a vertical parameter of a site when SEM data of the site are fed as inputs, by determining free parameters of the algorithm, such that residuals between the algorithm-estimated vertical parameters and the AFM-measured vertical parameters are about minimized; and (iv) using the calibrated algorithm to estimate vertical parameters of the sites in the complement to the calibration subset.


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