Hsinchu, Taiwan

Yao-Jen Yeh

USPTO Granted Patents = 4 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Zhudong Township, TW (2020)
  • Hsinchu, TW (2021 - 2024)

Company Filing History:


Years Active: 2020-2024

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4 patents (USPTO):

Title: Yao-Jen Yeh: Innovator in Ion Implantation Technology

Introduction

Yao-Jen Yeh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of ion implantation technology, holding a total of 4 patents. His work is instrumental in advancing semiconductor manufacturing processes.

Latest Patents

Yao-Jen Yeh's latest patents include an innovative ion implantation method and device. This system comprises a sample platform, an ion gun, an electrostatic linear accelerator, a direct current (DC) final energy magnet (FEM), and a processor. The processor is programmed to control various components, including a wafer acceptance test instrument, a DC recipe calculator, a DC real energy calculator, and a tool energy shift verifier. The system is designed to tune the DC FEM based on verified tool energy shifts, optimizing the peak magnetic field of the DC FEM. Another notable patent involves implanter calibration, which includes generating ions with an ion source based on an ion implantation recipe, accelerating these ions, and adjusting parameters of the final energy magnet based on analyzed energy spectra.

Career Highlights

Yao-Jen Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in ion implantation technology. His work has been pivotal in enhancing the efficiency and accuracy of semiconductor fabrication processes.

Collaborations

Throughout his career, Yao-Jen Yeh has collaborated with notable colleagues, including Yi-Hsiung Lin and Cheng-En Lee. These partnerships have fostered innovation and contributed to the development of advanced technologies in the semiconductor industry.

Conclusion

Yao-Jen Yeh's contributions to ion implantation technology and his innovative patents underscore his role as a leading inventor in the semiconductor field. His work continues to influence advancements in manufacturing processes, making a significant impact on the industry.

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