The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2021

Filed:

Jul. 29, 2019
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Yi-Hsiung Lin, Zhudong Township, TW;

Yao-Jen Yeh, Hsinchu, TW;

Chia-Lin Ou, Hsinchu, TW;

Cheng-En Lee, Hsinchu County, TW;

Hsuan-Pang Liu, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01L 21/67 (2006.01); H01L 21/265 (2006.01); H01J 37/304 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3171 (2013.01); H01L 21/265 (2013.01); H01L 21/67213 (2013.01); H01J 37/304 (2013.01);
Abstract

A method of tuning an ion implantation apparatus is disclosed. The method includes operations of applying any wafer acceptance test (WAT) recipe to a test sample, calculating a recipe for a direct current (DC) final energy magnet (FEM), calculating a real energy of the DC FEM, verifying the tool energy shift, and obtaining a peak spectrum of the DC FEM.


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