Company Filing History:
Years Active: 2014-2018
Introduction
Yanwei Liu is a distinguished inventor based in Danville, California, known for his significant contributions to the field of photolithography. With a total of eight patents to his name, Liu has made groundbreaking advancements in critical dimension uniformity and measurement techniques, positively impacting the semiconductor industry.
Latest Patents
Among his latest innovations is a patent focused on "Critical Dimension Uniformity Enhancement Techniques and Apparatus." This invention outlines methods and apparatus for inspecting photolithographic reticles by utilizing modeled images derived from a design database. By comparing the modelled images with actual images obtained through an inspection tool, Liu's methodology bins these images based on specific properties affected by neighboring features on the reticle. The analysis of these binned images then generates a characteristic uniformity map, which is vital for the fabrication process.
Another noteworthy patent addresses "Techniques and Systems for Model-Based Critical Dimension Measurements." Here, Liu's approach involves inspecting a reticle structure with an imaging system to derive its critical dimension, which may be initially unknown. Utilizing a comprehensive model that incorporates optical properties, a computational representation of the imaging system, and an adjustable critical dimension, the invention minimizes discrepancies between calculated and measured images. This iterative process ultimately results in an accurate determination of the unknown critical dimension.
Career Highlights
Currently, Yanwei Liu is employed at KLA-Tencor Corporation, a leader in process control and yield management solutions in the semiconductor space. His role aligns with his expertise, allowing him to drive innovations that enhance photolithographic technologies.
Collaborations
In his professional journey, Liu has collaborated with esteemed colleagues such as Daniel C. Wack and Abdurrahman Sezginer. These partnerships have fostered an environment of creativity and excellence, driving advancements in critical dimension measurement techniques.
Conclusion
Yanwei Liu's inventive spirit and technical prowess continue to shape the future of photolithographic processes. His contributions not only push the boundaries of technology but also set new standards in the industry. With eight patents, Liu stands as a testament to innovation in engineering, exemplifying how dedicated inventors can influence and enhance a critical sector like semiconductor manufacturing.
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