The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2016
Filed:
Aug. 26, 2013
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Qiang Zhang, Fremont, CA (US);
Yanwei Liu, Danville, CA (US);
Abdurrahman Sezginer, Monte Serano, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 1/00 (2006.01); G01J 1/42 (2006.01); G21K 7/00 (2006.01); G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
G01J 1/00 (2013.01); G01J 1/4257 (2013.01); G02B 5/0833 (2013.01); G02B 5/0891 (2013.01); G21K 7/00 (2013.01);
Abstract
Disclosed is test structure for measuring wave-front aberration of an extreme ultraviolet (EUV) inspection system. The test structure includes a substrate formed from a material having substantially no reflectivity for EUV light and a multilayer (ML) stack portion, such as a pillar, formed on the substrate and comprising a plurality of alternating pairs of layers having different refractive indexes so as to reflect EUV light. The pairs have a count equal to or less than 15.