This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Lam Research Corporation. Active years: 2018-2026.
Company Filing History:
Years Active: 2018-2026
Title: Yansha Jin: Innovator in Plasma Processing Technologies
Introduction
Yansha Jin is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of plasma processing technologies, holding a total of 3 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Yansha Jin's latest patents include a method for opening an amorphous carbon layer mask below a hardmask. This process involves performing one or more cycles that consist of an opening phase and a cleaning phase. During the opening phase, an opening gas containing oxygen is flowed into a plasma processing chamber, creating a plasma that etches features in the amorphous carbon layer mask. The cleaning phase follows, where a cleaning gas containing hydrogen, carbon, and halogen components is introduced to maintain the integrity of the mask.
Another significant patent focuses on edge roughness reduction in processing a stack with an etch layer below a mask. This method treats the mask by flowing a treatment gas that includes a sputtering gas and a trimming gas. By providing pulsed TCP power and a pulsed bias, the process effectively sputters and redeposits material from the mask, while also chemically trimming it to achieve desired specifications.
Career Highlights
Yansha Jin is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his innovative ideas in practical settings, contributing to advancements in semiconductor manufacturing.
Collaborations
Yansha collaborates with talented coworkers, including Zhongkui Tan and Ce Qin. Their combined expertise fosters a creative environment that drives innovation in their projects.
Conclusion
Yansha Jin's contributions to plasma processing technologies demonstrate his commitment to advancing the semiconductor industry. His innovative patents and collaborative efforts position him as a key figure in the field.